Specifications, methodologies and results of evaluation of optical critical dimension Scatterometer tools at the 90nm CMOS technology node and beyond

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 304-323

  Bunday, Benjamin D ^a   Peterson, Amy ^b   Allgair, John A ^a  

^a SEMATECH   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

AMAG; CD Metrology; CD SEM; Integrated Metrology; ISMI; OCD; Optical Critical Dimension; Scatterometer; Scatterometry; SEMATECH; Unified Specification

Indexed keywords

AMAG; CD METROLOGY; CD-SEM; INTEGRATED METROLOGY; ISMI; OPTICAL CRITICAL DIMENSIONS (OCD); SCATTEROMETERS; SCATTEROMETRY; SEMATECH; UNIFIED SPECIFICATION;

CMOS INTEGRATED CIRCUITS; DIMENSIONAL STABILITY; OPTICAL PROPERTIES; OPTICAL VARIABLES MEASUREMENT; SEMICONDUCTOR MATERIALS; SPECIFICATIONS; STANDARDS;

LIGHT SCATTERING;

EID: 24644437330     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600115     Document Type: Conference Paper

References (24)

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