Single crystal critical dimension reference materials (SCCDRM): Process optimization for the next generation of standards

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Dixson, Ronald G ^a   Guthrie, William F ^a   Cresswell, Michael ^a   Allen, Richard A ^a   Orji, Ndubuisi G ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Calibration; CD; CD AFM; Linewidth; Metrology; SCCDRM; Standards; Traceability; Uncertainty

Indexed keywords

REFERENCE MATERIALS; TRACEABILITY;

ATOMIC FORCE MICROSCOPY; CALIBRATION; LINEWIDTH; OPTIMIZATION; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; STANDARDS; UNCERTAINTY ANALYSIS;

SINGLE CRYSTALS;

EID: 34548040373     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713289     Document Type: Conference Paper

References (14)

1. R. Dixson, A. Guerry, "Reference Metrology using a Next Generation CD-AFM", SPIE Proceedings Vol. 5375, 633-646 (2004).
2. R. Dixson, J. Fu, N. Orji, W. Guthrie, R. Allen, M. Cresswell, "CD-AFM Reference Metrology at NIST and SEMATECH", SPIE Proceedings Vol. 5752, 324-336 (2005).
3. R. G. Dixson, R. A. Allen, W. F. Guthrie, and M. W. Cresswell, "Traceable Calibration of Critical-Dimension Atomic Force Microscope Linewidth Measurements with Nanometer Uncertainty" J. Vac. Sci. Technol. B Vol. 23, 3028-3032 (2005).
4. M. Cresswell, R. Dixson, W. Guthrie, R. Allen, C. Murabito, B. Park, J. Martinez, A. Hunt, "Critical Dimension Reference Features with Sub-Five Nanometer Uncertainty," SPIE Proceedings Vol. 5752, 288-303 (2005).
5. M. Cresswell, W. Guthrie, R. Dixson, R. A. Allen, C. E. Murabito, J. V. Martinez de Pinillos, "RM8111: Development of a Prototype Linewidth Standard," J. Res. Natl. Inst. Stand. Technol. 111, 187 - 203 (2006).
6. H. J. Patrick, T. A. Germer, M. W. Cresswell, R. A. Allen, R. G. Dixson, and M. Bishop, "Modeling and Analysis of In-Plane and Out-of-Plane Target and Substrate Scatterometry Signatures for Optical Critical Dimension Reference Material Applications," to be presented at the Frontiers of Characterization and Metrology for Nanoelectronics conference, to be held in Gaithersburg, MD March 27 - March 29, 2007.
7. R. Dixson, N. G. Orji, S. Shirke, M. Tortonese, "Comparison and Uncertainties of Standards for CD-AFM Width Calibration," to be published in SPIE Proceedings for Advanced Lithography Conference (2007).
8. R. A. Allen, M. W. Cresswell, C. E. Murabito, R. G. Dixson, E. H. Bogardus, "Critical Dimension Calibration Standards for ULSI Metrology," in Characterization and Metrology for ULSI Technology, AIP Conference Proceedings Vol. 683, 421-428 (2003).
9. R. A. Allen, B. A. am Ende, M. W. Cresswell, C. E. Murabito, T. J. Headly, W. F. Guthrie, L. W. Linholm, C.H. Ellenwood, E. H. Bogardus, "Test structures for referencing electrical linewidth measurements to silicon lattice parameters using HRTEM," IEEE Transactions on Semiconductor Manufacturing, Vol 16, 239-248 (2003).
10. M. W. Cresswell, E. H. Bogardus, J. V. Martinez de Pinillos, M. H. Bennett, R. A. Allen, W. F. Guthrie, C. E. Murabito, B. A. am Ende, L. W. Linholm, "CD Reference Materials for Sub-Tenth Micrometer Applications," SPIE Proceedings Vol. 4689, 116 -127 (2002).
11. J. Villarrubia, R. Dixson, S. Jones, J. R. Lowney, M. T. Postek, R. A. Allen, M. W. Cresswell, "Intercomparison of SEM, AFM, and electrical linewidths," SPIE Proceedings Vol. 3677, 587-440 (1999).
12. G. E. P. Box, W. G. Hunter, J. S. Hunter, "Statistics for Experimenters: An Introduction to Design, Data Analysis, and Model Building," Wiley-Interscience; 1st edition June 22 (1978).
13. C. A. Savran, A. W. Sparks, J. Sihler, J. Li, W. Wu, D. E. Berlin, T. P. Burg, "Fabrication and characterization of a micromechanical sensor for differential detection of nanoscale motions," Journal of Microelectromechanical Systems, Vol. 11, 703 - 708, (2002).
14. R. A. Allen, M. W. Cresswell, R. G. Dixson, W. F. Guthrie, B. J. R. Shulver, J. T. M. Stevenson, A. J. Walton, "CD Reference Materials Fabricated on Monolithic 200 mm Wafers for Automated Metrology Tool Applications," to be presented at the Frontiers of Characterization and Metrology for Nanoelectronics conference, to be held in Gaithersburg, MD March 27 - March 29, 2007.