Higher order tip effects in traceable CD-AFM-based linewidth measurements

Measurement Science and Technology

Volumn 18, Issue 2, 2007, Pages 448-455

  Orji, N G ^a,b   Dixson, R G ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

Critical dimension atomic force microscope; Linewidth; Tip effects; Uncertainty

Indexed keywords

ATOMIC FORCE MICROSCOPY; MEASUREMENT THEORY; PARAMETER ESTIMATION; SURFACE ROUGHNESS;

CRITICAL DIMENSION ATOMIC FORCE MICROSCOPE; MEASUREMENT SYSTEMS; TIP EFFECTS;

LINEWIDTH;

ATOMIC FORCE MICROSCOPY; LINEWIDTH; MEASUREMENT THEORY; PARAMETER ESTIMATION; SURFACE ROUGHNESS;

EID: 34247268333     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/18/2/S17     Document Type: Conference Paper

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