Small feature accuracy challenge for CD-SEM metrology physical model solution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Bunday, Benjamin ^a   Allgair, John ^a   Adan, Ofer ^b   Tarn, Aviram ^b   Latinski, Sergey ^b   Eytan, Guy ^b  

^a SEMATECH   (United States)

^b Applied Materials Inc Israel   (Israel)

Author keywords

3 D imaging; Accuracy; Applied Materials; CD SEM; ISMI; Modeling; SEMATECH; Simulation; Small Lines; Total Measurement uncertainty; VeritySEM II

Indexed keywords

3-D IMAGING; ACCURACY; APPLIED MATERIALS; CRITICAL DIMENSION-SCANNING ELECTRON MICROSCOPY (CD-SEM); ISMI; MODELING; SEMATECH; SMALL LINES; TOTAL MEASUREMENT UNCERTAINTY; VERITYSEM II;

ALGORITHMS; COMPUTER SIMULATION; MATHEMATICAL MODELS; MEASUREMENT THEORY; OPTICAL FIBER FABRICATION; PROBLEM SOLVING; PROCESS CONTROL; PRODUCTION ENGINEERING; SCANNING ELECTRON MICROSCOPY; WAVEFORM ANALYSIS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 33745621864     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659779     Document Type: Conference Paper

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