Specifications and methodologies for benchmarking of advanced CD-SEMs at the 90nm CMOS technology node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 1038-1052

  Bunday, Benjamin D ^a   Bishop, Michael ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BENCHMARKING; CMOS INTEGRATED CIRCUITS; ELECTRON BEAM LITHOGRAPHY; ETCHING; MASKS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SHRINKAGE; SILICON WAFERS; SPECIFICATIONS;

CITICAL DIMENSION MEASUREMENT; CRITICAL DIMENSION CONTROL; CRITICAL DIMENSION SCANNING ELECTRON MICROSCOPY;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0141723536     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483663     Document Type: Conference Paper

References (13)

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