Implementation of a reference measurement system using CD-AFM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 150-165

  Dixson, Ronald ^a,b   Guerry, Angela ^b   Bennett, Marylyn ^b   Vorburger, Theodore ^a   Bunday, Ben ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

AFM; Calibration; CD; Linewidth; Metrology; Reference measurement system; Standards; Traceability

Indexed keywords

ATOMIC FORCE MICROSCOPY; EVALUATION; METRIC SYSTEM; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SHRINKAGE; TECHNOLOGICAL FORECASTING;

CRITICAL DIMENSION ATOMIC FORCE MICROSCOPY; CRITICAL DIMENSION SCANNING ELECTRON MICROSCOPY; REFERENCE MEASUREMENT SYSTEM; TRACEABILITY;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141500279     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483667     Document Type: Conference Paper

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