Scatterometry measurement precision and accuracy below 70 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 224-238

  Sendelbach, Matthew ^a   Archie, Chas ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

3D metrology; Accuracy; CD AFM; CD SEM; Precision; Reference measurement system; RMS; Scatterometry; TMU; Total measurement uncertainty

Indexed keywords

ATOMIC FORCE MICROSCOPY; DENSITY (OPTICAL); DIFFRACTION GRATINGS; LIGHT REFLECTION; LIGHT SCATTERING; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

NORMAL INCIDENCE SPECTROSCOPIC REFLECTROMETRY; REFERENCE MEASUREMENT SYSTEM; SCATTEROMETRY MEASUREMENT; TOTAL MEASUREMENT UNCERTAINTY;

ELLIPSOMETRY;

EID: 0141835067     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.488117     Document Type: Conference Paper

References (4)

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3. B. Banke and C Archie, "Characteristics of accuracy for CD metrology," Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, Editor, Proceedings of SPIE, Vol. 3677, pp. 291-308, 1999.
4. J. Devore, Probability and Statistics for Engineering and the Sciences, Chapter 12: "Simple linear regression and correlation", pp. 488-542, Duxbury Thomson Learning, Pacific Grove, California, 2000.