-
1
-
-
0042285088
-
Fabrication of solid-state nanopores with single-nanometre precision
-
Storm A J, Chen J H, Ling X S, Zandbergen H W and Dekker C 2003 Fabrication of solid-state nanopores with single-nanometre precision Nat. Mater. 2 537
-
(2003)
Nat. Mater.
, vol.2
, pp. 537
-
-
Storm, A.J.1
Chen, J.H.2
Ling, X.S.3
Zandbergen, H.W.4
Dekker, C.5
-
2
-
-
79956016490
-
Simple fabrication scheme for sub-10 nm electrode gaps using electron beam lithography
-
Liu K, Avouris Ph, Bucchignano J, Martel R, Sun S and Michl J 2002 Simple fabrication scheme for sub-10 nm electrode gaps using electron beam lithography Appl. Phys. Lett. 80 865
-
(2002)
Appl. Phys. Lett.
, vol.80
, Issue.5
, pp. 865
-
-
Liu, K.1
Ph, A.2
Bucchignano, J.3
Martel, R.4
Sun, S.5
Michl, J.6
-
3
-
-
13744250830
-
Submicrometer hall devices fabricated by focused electron-beam-induced deposition
-
Boero G, Utke I, Bret T, Quack N, Todorova M, Mouaziz S, Kejik P, Brugger J, Popovic R S and Hoffmann P 2004 Submicrometer hall devices fabricated by focused electron-beam-induced deposition Appl. Phys. Lett. 86 042503
-
(2004)
Appl. Phys. Lett.
, vol.86
, Issue.4
, pp. 042503
-
-
Boero, G.1
Utke, I.2
Bret, T.3
Quack, N.4
Todorova, M.5
Mouaziz, S.6
Kejik, P.7
Brugger, J.8
Popovic, R.S.9
Hoffmann, P.10
-
4
-
-
0000611089
-
Fabrication and characterization of platinum nanocrystalline material grown by electron-beam induced deposition
-
Koops H W P, Kaya A and Weber M 1995 Fabrication and characterization of platinum nanocrystalline material grown by electron-beam induced deposition J. Vac. Sci. Technol. B 13 2400
-
(1995)
J. Vac. Sci. Technol.
, vol.13
, Issue.6
, pp. 2400
-
-
Koops, H.W.P.1
Kaya, A.2
Weber, M.3
-
5
-
-
31144468886
-
Influence of process variables on electron beam chemical vapor deposition of platinum
-
Beaulieu D, Ding Y, Wang Z L and Lackey W J 2005 Influence of process variables on electron beam chemical vapor deposition of platinum J. Vac. Sci. Technol. B 23 2151
-
(2005)
J. Vac. Sci. Technol.
, vol.23
, Issue.5
, pp. 2151
-
-
Beaulieu, D.1
Ding, Y.2
Wang, Z.L.3
Lackey, W.J.4
-
6
-
-
22944478665
-
Mechanics of hydrogenated amorphous carbon deposits from electron-beam-induced deposition of a paraffin precursor
-
Ding W, Dikin D A, Chen X, Piner R D, Ruoff R S, Zussman Z, Wang X and Li X 2005 Mechanics of hydrogenated amorphous carbon deposits from electron-beam-induced deposition of a paraffin precursor J. Appl. Phys. 98 014905
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 014905
-
-
Ding, W.1
Dikin, D.A.2
Chen, X.3
Piner, R.D.4
Ruoff, R.S.5
Zussman, Z.6
Wang, X.7
Li, X.8
-
7
-
-
10444255254
-
Monte Carlo modeling of electron-solid interactions
-
Shimizu R and Ding Z J 1992 Monte Carlo modeling of electron-solid interactions Rep. Prog. Phys. 55 487
-
(1992)
Rep. Prog. Phys.
, vol.55
, Issue.4
, pp. 487
-
-
Shimizu, R.1
Ding, Z.J.2
-
8
-
-
0000058469
-
Monte Carlo simulation of backscattered electrons and energy from thick targets and surface films
-
Dapor M 1992 Monte Carlo simulation of backscattered electrons and energy from thick targets and surface films Phys. Rev. B 46 618
-
(1992)
Phys. Rev.
, vol.46
, Issue.2
, pp. 618
-
-
Dapor, M.1
-
9
-
-
0000413250
-
Monte Carlo simulation study of reflection-electron-energy-loss- spectroscopy spectrum
-
Ding Z J and Shimizu R 2000 Monte Carlo simulation study of reflection-electron-energy-loss-spectroscopy spectrum Phys. Rev. B 61 14128
-
(2000)
Phys. Rev.
, vol.61
, Issue.20
, pp. 14128
-
-
Ding, Z.J.1
Shimizu, R.2
-
10
-
-
27744484845
-
Spatial resolution limits in electron-beam-induced deposition
-
Silvis-Cividjian N, Hagen C W and Kruit P 2005 Spatial resolution limits in electron-beam-induced deposition J. Appl. Phys. 98 084905
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 084905
-
-
Silvis-Cividjian, N.1
Hagen, C.W.2
Kruit, P.3
-
11
-
-
18544385940
-
Three-dimensional nanofabrication by electron-beam-induced deposition using 200-keV electrons in scanning transmission electron microscope
-
Liu Z Q, Mitsuishi K and Furuya K 2005 Three-dimensional nanofabrication by electron-beam-induced deposition using 200-keV electrons in scanning transmission electron microscope Appl. Phys. A 80 1437
-
(2005)
Appl. Phys.
, vol.80
, pp. 1437
-
-
Liu, Z.Q.1
Mitsuishi, K.2
Furuya, K.3
-
12
-
-
0036643634
-
The role of secondary electrons in electron-beam-induced-deposition spatial resolution
-
Silvis-Cividjian N, Hagen C W, Leunissen L H A and Kruit P 2002 The role of secondary electrons in electron-beam-induced-deposition spatial resolution Microelectron. Eng. 61/62 693
-
(2002)
Microelectron. Eng.
, vol.61-62
, Issue.1-3
, pp. 693
-
-
Silvis-Cividjian, N.1
Hagen, C.W.2
Leunissen, L.H.A.3
Kruit, P.4
-
13
-
-
14944366469
-
Dynamic profile calculation of deposition resolution by high-energy electrons in electron-beam-induced deposition
-
Mitsuishi K, Liu Z Q, Shimojo M, Han M and Furuya K 2005 Dynamic profile calculation of deposition resolution by high-energy electrons in electron-beam-induced deposition Ultramicroscopy 103 17
-
(2005)
Ultramicroscopy
, vol.103
, Issue.1
, pp. 17
-
-
Mitsuishi, K.1
Liu, Z.Q.2
Shimojo, M.3
Han, M.4
Furuya, K.5
-
17
-
-
0009363115
-
Monte Carlo calculation of low-energy electron emission from surfaces
-
Allen T E, Kunz R R and Mayer T M 1988 Monte Carlo calculation of low-energy electron emission from surfaces J. Vac. Sci. Technol. B 6 2057
-
(1988)
J. Vac. Sci. Technol.
, vol.6
, Issue.6
, pp. 2057
-
-
Allen, T.E.1
Kunz, R.R.2
Mayer, T.M.3
-
18
-
-
2542456532
-
Synthesis of uniform GaN quantum dot arrays via electron nanolithography
-
Crozier P A, Tolle J, Kouvetakis J and Ritter C 2004 Synthesis of uniform GaN quantum dot arrays via electron nanolithography Appl. Phys. Lett. 84 3441
-
(2004)
Appl. Phys. Lett.
, vol.84
, Issue.18
, pp. 3441
-
-
Crozier, P.A.1
Tolle, J.2
Kouvetakis, J.3
Ritter, C.4
-
19
-
-
0001060599
-
Resolution limits in electron-beam induced tungsten deposition
-
Kohlmann-von Platen K T, Chlebek J, Weiss M, Reimer K, Oertel H and Brünger W H 1993 Resolution limits in electron-beam induced tungsten deposition J. Vac. Sci. Technol. B 11 2219
-
(1993)
J. Vac. Sci. Technol.
, vol.11
, Issue.6
, pp. 2219
-
-
Kohlmann-Von Platen, K.T.1
Chlebek, J.2
Weiss, M.3
Reimer, K.4
Oertel, H.5
Brünger, W.H.6
-
20
-
-
29044446431
-
Growth and simulation of high-aspect ratio nanopillars by primary and secondary electron-induced deposition
-
Fowlkes J D, Randolph S J and Rack P D 2005 Growth and simulation of high-aspect ratio nanopillars by primary and secondary electron-induced deposition J. Vac. Sci. Technol. B 23 2825
-
(2005)
J. Vac. Sci. Technol.
, vol.23
, Issue.6
, pp. 2825
-
-
Fowlkes, J.D.1
Randolph, S.J.2
Rack, P.D.3
-
21
-
-
14944361396
-
Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructures
-
Bret T, Utke I and Hoffmann P 2005 Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructures Microelectron. Eng. 78/79 307
-
(2005)
Microelectron. Eng.
, vol.78-79
, pp. 307
-
-
Bret, T.1
Utke, I.2
Hoffmann, P.3
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