Progress toward realization of the digital electrostatic e-beam array lithography (DEAL) concept

Technical Digest of the 18th International Vacuum Nanoelectronics Conference, IVNC 2005

Volumn 2005, Issue , 2005, Pages 74-75

  Baylor, L R ^a   Gardner, W L ^a   Yang, X ^b   Kasica, R J ^a   Blalock, B ^b   Durisety, C ^b   Fowlkes, J ^b   Hensley, D K ^a   Islam, S ^b   Joy, D C ^b   Melechko, A V ^b   Rack, P D ^b   Randolph, S J ^b   Rucker, R ^b   Thomas, D K ^a   Simpson, M L ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33947277264     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IVNC.2005.1619491     Document Type: Conference Paper

References (4)

1. This research was sponsored by the Defense Advanced Research Projects Agency (DARPA) under contract No. DARPA-MIPR-97-1357 with Oak Ridge National Laboratory (ORNL). The research was carried out at ORNL, managed by UT-Battelle, LLC, for the U.S. Department of Energy under contract No. DE-AC05-00OR22725.
2. L. R. Baylor, D.H. Lowndes, M.L. Simpson, C.E. Thomas, et al., J. Vac. Tech. B 20, 2646 (2002).
3. M. A. Guillorn, A.V. Melechko, V.I. Merkulov et al., Appl. Phys. Lett. 79, 3506 (2001).
4. L.R. Baylor, W.L. Gardner, X. Yang, , et al., J. Vac. Sci. Tech. B 22, 3022 (2004).