Initial lithography results from the digital electrostatic e-beam array lithography concept

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3021-3024

  Baylor, L R ^a   Gardner, W L ^a   Yang, X ^b   Kasica, R J ^a   Guillorn, M A ^c   Blalock, B ^b   Cul, H ^a   Hensley, D K ^a   Islam, S ^b   Lowndes, D H ^a   Melechko, A V ^b   Merkulov, V I ^a   Joy, D C ^a   Rack, P D ^b   Simpson, M L ^a   Thomas, D K ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF TENNESSEE   (United States)

^c Department of Theoretical and Applied Mechanics and the Cornell Nanofabrication Facility   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAMLETS; DIGITALLY ADDRESSABLE FIELD-EMISSION ARRAY (DAFEA); ELECTRON ENERGY; NANOFIBERS;

CARBON NANOTUBES; CMOS INTEGRATED CIRCUITS; ELECTROSTATICS; EXTRACTION; EXTRAPOLATION; FIELD EMISSION DISPLAYS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY;

ELECTRON BEAMS;

EID: 19944433803     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1824060     Document Type: Conference Paper

References (12)

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