An atomistic introduction to anisotropic etching

Journal of Micromechanics and Microengineering

Volumn 17, Issue 4, 2007, Pages

  Gosalvez M A ^a   Sato, K ^a   Foster, A S ^b   Nieminen, R M ^b   Tanaka, H ^c  

^a NAGOYA UNIVERSITY   (Japan)

^b AALTO UNIVERSITY   (Finland)

^c DENSO CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC ETCHING; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; DIFFUSION; NUCLEATION; SURFACE PROPERTIES;

ETCHANT CATIONS; ETCHING RATE; MICROMASKING; MICROMASKING AGENTS;

SEMICONDUCTING SILICON;

EID: 34249036454     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/4/S01     Document Type: Conference Paper

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