The construction of orientation-dependent crystal growth and etch rate functions II: Application to wet chemical etching of silicon in potassium hydroxide

Journal of Applied Physics

Volumn 87, Issue 12, 2000, Pages 8732-8740

  Van Veenendaal, E ^a   Van Suchtelen, J ^a   Van Enckevort, W J P ^a   Sato, K ^b   Nijdam, A J ^c   Gardeniers, J G E ^c   Elwenspoek, M ^c  

^a RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^b NAGOYA UNIVERSITY   (Japan)

^c UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001508947     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373603     Document Type: Article

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