Micropyramidal hillocks on KOH etched {100} silicon surfaces: formation, prevention and removal

Journal of Micromechanics and Microengineering

Volumn 9, Issue 2, 1999, Pages 139-145

  Schroder H ^a   Obermeier, E ^a   Steckenborn, A ^b  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^b SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ETCHING; MASKS; OXYGEN; POTASSIUM COMPOUNDS; SILICON WAFERS; SURFACE PROPERTIES;

MICROMASKING; MICROPYRAMIDS; POTASSIUM HYDROXIDE; SURFACE DENSITY;

MICROMACHINING;

EID: 0033138335     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/9/2/309     Document Type: Article

References (24)

1. Kern W 1978 RCA Rev. 38 287-308
2. Seidel H, Csepregi L, Heuberger A and Baumgärtel H 1990 J. Electrochem. Soc. 137 3612-26
3. Palik E D, Glembocki O J, Heard I, Burno P S and Tenerz L 1991 J. Appl. Phys. 70 3291-300
4. Campbell S A, Cooper K, Dixon L, Earwaker R, Port S N and Schiffrin D J 1995 J. Micromech. Microeng. 5 209-18
5. Vu Q B, Stricker D A and Zavracky P M 1996 J. Electrochem. Soc. 143 1372-5
6. Tan S, Reed M, Han H and Boudreau R 1994 J. Micromech. Microeng. 4 147-55
7. Bhatnagar Y K and Nathan A 1993 Sensors Actuators A 36 233-40
8. Matsuoka M, Yoshida Y and Moronuki M 1992 J. Chem. Eng. Japan 25 735-40
9. Schnakenberg U, Benecke W and Löchel B 1990 Sensors Actuators A 21 1031-5
10. Gajda M A, Ahmed H, Shaw J E A and Putnis A 1994 Sensors Actuators A 40 227-36
11. Batterman B W 1957 J. Appl. Phys. 28 1236-41
12. Tan S S, Reed M L and Boudreau R 1996 J. Microelectromech. Syst. 5 66-73
13. Tan S, Han H, Boudreau R and Reed M 1994 IEEE Micro Electro Mechanical Systems (New York: IEEE) pp 223-8
14. Bressers P M M C, Kelly J J, Gardeniers J G E and Elwenspoek M 1996 J. Electrochem. Soc. 143 1744-50
15. Shimura F 1980 J. Electrochem. Soc. 127 910-3
16. Landsberger L M, Naseh S, Kahrizi M and Paranjape M 1996 J. Microelectromech. Syst. 5 106-16
17. Bender H and Vanhellemont J 1994 Handbook of Semiconductors ed T S Moss vol 3B, ed S Mahajan (Amsterdam: North-Holland) pp 1670-83
18. Okmetik specification
19. Shimura F 1994 Oxygen in Silicon (Semiconductor and Semimetals 42) (New York: Academic)
20. Müller T, Feichtinger T, Fankhauser B, Benkitsch A C, Brand O and Baltes H 1998 Micromechanics Eur. 1998, 7. Workshop on Micromachining, Micromechanics and Micro-systems (Ulvik, 1998) Tech. Digest pp 59-62
21. Aoki S 1993 Mater. Trans. JIM 34 746-52
22. Bassous E and Baran E F 1978 J. Electrochem. Soc. 125 1321-7
23. Lee D B 1969 J. Appl. Phys. 40 4569-74
24. Allongue P, Brune H and Gerischer H 1992 Surf. Sci. 275 414