The effect of isopropyl alcohol on etching rate and roughness of (100) Si surface etched in KOH and TMAH solutions

Sensors and Actuators, A: Physical

Volumn 93, Issue 2, 2001, Pages 138-147

  Zubel, I ^a   Kramkowska, M ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Silicon anisotropic etching; Surface adsorption; Surface roughness

Indexed keywords

ADSORPTION; ALCOHOLS; COMPOSITION EFFECTS; CRYSTALLOGRAPHY; ETCHING; IONS; MORPHOLOGY; SILICON WAFERS; SOLUTIONS; SURFACE ROUGHNESS;

ISOPROPYL ALCOHOL; POTASSIUM HYDROXIDE; TETRAMETHYL AMMONIUM HYDROXIDE;

MICROELECTROMECHANICAL DEVICES;

EID: 0035975568     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(01)00648-3     Document Type: Article

References (15)

1. Anisotropic etching of silicon crystals in KOH solution. Part II. Theoretical two-dimensional etched shapes: Discussion of the adequation of the dissolution slowness surface
2. Roughening of single-crystal silicon surface etched by KOH water solutions
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4. Anisotropic etching of silicon in complexant redox alkaline system
5. Catalytic control of anisotropic silicon etching
6. TMAH/IPA anisotropic etching characteristics
7. Silicon anisotropic etching in alkaline solutions IV: The effect of organic and inorganic agents on silicon anisotropic etching process
8. Silicon anisotropic etching in alkaline solutions III: On the possibility of spatial structures forming in the course of Si(1 0 0) anisotropic etching in KOH and KOH + IPA solutions
9. Anisotropic etching of crystalline silicon in alkaline solutions
10. Characterization of orientation-dependent etching properties of single-crystal silicon: Effects of KOH concentration
11. TMAH etching of silicon and interaction of etching parameters
12. Anisotropically etched silicon mirrors for optical sensor applications
13. 4NOH solutions
14. Silicon anisotropic etching of crystalline silicon in alkaline solutions II: On the influence of anisotropy on the smoothness of etched surfaces