Composition, surface morphology and electrical characteristics of Al2O3-TiO2 nanolaminates and AlTiO films on silicon

Thin Solid Films

Volumn 515, Issue 1, 2006, Pages 346-352

  Mikhelashvili, V ^a   Eisenstein, G ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

Chemical and structural properties; Electrical characterization; Electron beam gun deposition; Thin dielectric films

Indexed keywords

CHEMICAL PROPERTIES; ELECTRICAL CHARACTERIZATION; ELECTRON BEAM GUN DEPOSITION; STRUCTURAL PROPERTIES; THIN DIELECTRIC FILMS;

ALUMINA; CURRENT DENSITY; ELECTRON GUNS; LAMINATES; THIN FILMS; TITANIUM DIOXIDE;

NANOSTRUCTURED MATERIALS;

EID: 33749987824     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.097     Document Type: Article

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