Structural and electrical characterization of TiO2 grown from titanium tetrakis-isopropoxide (TTIP) and TTIP/H2O ambients

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 1706-1711

  Yan, J ^a   Gilmer, D C ^b   Campbell, S A ^a   Gladfelter, W L ^b   Schmid, P G ^c  

^a UNIVERSITY OF MINNESOTA   (United States)

^b University of Colorado at Boulder ^*  (United States)

^c UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC VARIABLES MEASUREMENT; ELECTRON EMISSION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOS DEVICES; PLATINUM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON WAFERS; THIN FILMS; TITANIUM COMPOUNDS; WATER; X RAY DIFFRACTION;

DIELECTRIC CONSTANT; FORWARD RECOIL SPECTROMETRY; THERMIONIC EMISSION; TITANIUM TETRAKIS-ISOPROPOXIDE; WATER VAPOR;

TITANIUM DIOXIDE;

EID: 0030142902     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589214     Document Type: Article

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