Effects of annealing conditions on optical and electrical characteristics of titanium dioxide films deposited by electron beam evaporation

Journal of Applied Physics

Volumn 89, Issue 6, 2001, Pages 3256-3269

  Mikhelashvili, V ^a   Eisenstein, G ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035868234     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1349860     Document Type: Article

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