Electrical characteristics of Ta2O5 thin films deposited by electron beam gun evaporation

Applied Physics Letters

Volumn 75, Issue 18, 1999, Pages 2836-2838

  Mikhelashvili, V ^a   Eisenstein, G ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000844083     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125166     Document Type: Article

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