Direct synthesis of photosensitive poly(benzoxazole)

Journal of Photopolymer Science and Technology

Volumn 14, Issue 1, 2001, Pages 55-59

  Ebara, Kazuya ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Direct synthesis; Photoresist; Poly(benzoxazole); Poly(o hydroxyamide)

Indexed keywords

NAPHTHOQUINONE; POLY(BENZOXAZOLE); POLYMER; TETRAMETHYLAMMONIUM; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL ANALYSIS; DISSOLUTION; IMAGE ANALYSIS; PHOTOSENSITIVITY; POLYMERIZATION; PROTON NUCLEAR MAGNETIC RESONANCE; SCANNING ELECTRON MICROSCOPY; SYNTHESIS; THERMAL ANALYSIS;

EID: 0035747368     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.55     Document Type: Article

References (10)