Novel positive-working and aqueous-base-developable photosensitive poly(imide benzoxazole) precursor

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 42, Issue 23, 2004, Pages 5990-5998

  Hsu, Steve Lien Chung ^a   Chen, Hui Tzu ^a   Tsai, Shih Jung ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Photoresists; Poly(imide benzoxazole) precursor; Polyimides; Positive working; Synthesis

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; INTEGRATED CIRCUITS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTORESISTS; PHOTOSENSITIVITY; SENSITIVITY ANALYSIS; SYNTHESIS (CHEMICAL); THERMAL CYCLING;

PASSIVATION LAYERS; POLY(IMIDE BENZOXAZOLE); POSITIVE WORKING; PRECURSORS;

POLYIMIDES;

EID: 10044259559     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.20438     Document Type: Article

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