Negative-Working Photosensitive Polybenzoxazoles Based on Hyperbranched Poly(o-hydroxyamide)s

Polymer Journal

Volumn 35, Issue 7, 2003, Pages 586-591

  Hong, Chi Sun ^a   Jikei, Mitsutoshi ^a   Kakimoto, Masa Aki ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Cross Linking; Hyperbranched Polymer; Negative Type Photoresist; Photoacid Generator (PAG); Photosensitive Polymer; Poly(o hydroxyamide)s; Polybenzoxazoles

Indexed keywords

CATALYSIS; CROSSLINKING; HEAT TREATMENT; MONOMERS; PHOTOSENSITIVITY; POLYCONDENSATION;

PHOTOACID GENERATORS (PAG);

ORGANIC POLYMERS;

EID: 0141717977     PISSN: 00323896     EISSN: None     Source Type: Journal    
DOI: 10.1295/polymj.35.586     Document Type: Article

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