Three-component negative-type photosensitive polyimide precursor based on poly(amic acid), a crosslinker, and a photoacid generator

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 43, Issue 3, 2005, Pages 593-599

  Watanabe, Yasufumi ^a   Fukukawa, Ken Ichi ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Alkaline developable polymer; Crosslinking; Photoacid generator; Photoresists; Polyimides

Indexed keywords

ACETONITRILE; CROSSLINKING; ELECTRIC POTENTIAL; HEATING; METHANOL; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHENOLS; PHOTORESISTS; PHOTOSENSITIVITY; POLYMERS; RING OPENING POLYMERIZATION; THERMAL EFFECTS; THERMOGRAVIMETRIC ANALYSIS; VISCOSITY;

ALKALINE-DEVELOPABLE POLYMERS; PHOTOACID GENERATORS; PHOTOSENSITIVE POLYIMIDES (PSPI); POLY(AMIC ACID)S (PAA);

POLYIMIDES;

EID: 13144257770     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.20554     Document Type: Article

References (16)

1. Ghosh, M. K.; Mittal, K. L., Eds. Polyimides Fundamentals and Applications; Marcel Decker: New York, 1996.
2. Rubner, R.; Ahne, H.; Kuhn, E.; Kolodziej, G. Photo Sci Eng 1979, 23, 303.
3. Rubner, R.; Bartel, B.; Bald, G. Slemens Forsch Entwickl Ber 1976, 5, 235.
4. Zhang A.; Li X.; Nah C.; Hwang K; Lee, M-H. J Polym Sci Part A: Polym Chem 2003, 41, 22.
5. Nakayama, T.; Mochizuki, A.; Ueda, M. React Funct Polym 1996, 30, 109.
6. Kubota, S.; Moriwaki, T.; Ando, T.; Fukami, A. J Appl Polym Sci 1987, 33, 1763.
7. Mochizuki, A.; Teranishi, T.; Ueda, M.; Matsushita, K. Polymer 1995, 11, 2153.
8. Moreau, W. H.; Chiong, K. N. U.S. Patent 4,880,722, 1989.
9. Moss, M. G.; Cuzman, R. M.; Brewer, T. In Advances in Resist Technology and Processing VI Proceedings of SPIE, Vol. 1086; Society of Optical Instrumentation Engineers: Bellingham, WA, 1989; p 396.
10. Hayase, S.; Takano, K.; Mikogami, Y.; Nakano, Y. J Electrochem Soc 1991, 138, 3525.
11. Omote, T.; Yamaoka, T. Polym Eng Sci 1992, 32, 1634.
12. Ueda, M.; Nakayama, T. Macromolecules 1996, 29, 6427.
13. Takeshi, K; Okuyama, K; Ohba, Y.; Ueda, M. J Photopolym Sci Technol 2000, 13, 345.
14. Asakura, T.; Yamato, H.; Ohkawa, M. J Photopolym Sci Technol 2000, 13, 223.
15. Takeda, N.; Ishimaru, E. Japan Patent 58,116,433, 1983.
16. Fukukawa, K.; Ebara, K; Shibasaki, Y.; Ueda, M. In Advances in Imaging Materials and Processes; Ito, H.; Varanasi, P. R.; Khojasteh, M. M.; Chen, R., Eds.; SPE Mid-Hudson Section: Hopewell Junction, NY, 2003; p 339.