Three-component negative-type photosensitive polyimide precursor based on poly(amic acid), a crosslinker, and a photoacid generator

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 43, Issue 3, 2005, Pages 593-599

  Watanabe, Yasufumi ^a   Fukukawa, Ken Ichi ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a  

^a Grad Sch of Sci and Engineering ^*  (Japan)

Author keywords

Alkaline developable polymer; Crosslinking; Photoacid generator; Photoresists; Polyimides

Indexed keywords

ACETONITRILE; CROSSLINKING; ELECTRIC POTENTIAL; HEATING; METHANOL; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHENOLS; PHOTORESISTS; PHOTOSENSITIVITY; POLYMERS; RING OPENING POLYMERIZATION; THERMAL EFFECTS; THERMOGRAVIMETRIC ANALYSIS; VISCOSITY;

ALKALINE-DEVELOPABLE POLYMERS; PHOTOACID GENERATORS; PHOTOSENSITIVE POLYIMIDES (PSPI); POLY(AMIC ACID)S (PAA);

POLYIMIDES;

EID: 13144257770     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/pola.20554     Document Type: Article

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