A novel positive photosensitive polybenzoxazole based on a tetrahydropyranyl (THP) protected polyhydroxyamide

Polymer Bulletin

Volumn 50, Issue 5-6, 2003, Pages 295-302

  Hsu, Steve Lien Chung ^a   Chen, Wan Chi ^a   Lee, Po I ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; KETONES; LOW TEMPERATURE EFFECTS; PHOTOSENSITIVITY; POLYMERIZATION; THICK FILMS;

DARK FILMS;

POLYAMIDES;

1,2 NAPHTHOQUINONE DERIVATIVE; 1,2 NAPHTHOQUINONE DIAZIDE 4 SULFONATE; 2,2' BIS (3 AMINO 4 HYDROXYPHENYL)HEXAFLUOROPROPANE; 3,4 DIHYDRO 2H PYRAN; HYDROXYAMINO ACID; ISOPHTHALOYL CHLORIDE; POLYHYDROXYAMIDE; PROPANE; PYRAN DERIVATIVE; TETRAHYDROPYRANYL ETHER; TOLUENESULFONIC ACID DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; CATALYST; CHEMICAL ANALYSIS; CHEMICAL BINDING; CHEMICAL COMPOSITION; CHEMICAL REACTION KINETICS; CHEMICAL STRUCTURE; CONTRAST; FILM; LOW TEMPERATURE PROCEDURES; PHOTOSENSITIVITY; POLYMERIZATION; SENSITIVITY ANALYSIS; SYNTHESIS;

EID: 0041767584     PISSN: 01700839     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00289-003-0171-y     Document Type: Article

References (24)

1. Makabe H, Banba T, Hirano T, J. Photopolym Sci & Tech (1997) 10(2): 307
2. Tokoh A, Photosensitive Polymers, (1999) Kansai Research Institute, Japan, pp 89-90
3. Dang TD, Mather PT, Alexander MD, Grayson Jr. CJ, Houtz MD, Spry RJ, Arnold FE, J. Polym. Sci., Polym. Chem. (2000) 38: 1991
4. th Inter. Conf. Photopolymers, Mcafee, New Jersey (1997) pp. 470-475.
5. Imai Y, Shibasaki Y, Takeuchi H, Park KH, Kakimoto MA. High Performance Polymer (2002) 14: 253
6. Kim TK, Choi, KY, Lee KS, Park, DW, Jin, MY. Polym Bull (2000) 44: 55
7. Dammel R. Diazonaphthoquinone-Based Resists, (1993) SPIE turtorial text, SPIE Optical Engineering Press
8. Ahne H, Kuhn E, Rubner R. US patent 4339521 (1982).
9. Mueller WH, Khanna DN and Hupfer B. US patent 5240819 (1993).
10. Hsu SLC, Chen WC. Polymer (2002) 43: 6743
11. Uenishi K, Kawabe Y, Kokubo T, Blakeney A. Proc. SPIE, (1991) 1466: 102
12. Kubota T. J Polym Sci, Polym Lett (1964) 2: 655
13. Joseph WD, Abed JC, Yoon TH, McGrath JE. Polym Prepr (1994) 35(1): 551
14. Yamaoka T, Nishiki M, Koseki K. Polym. Eng. & Sci. (1989) 29: 856
15. Miyashita N, Yoshikoshi A, Grieco PA. J Org Chem (1977) 42: 3772
16. Kantam ML, Santhi PL. Synth Commun (1993) 23(16): 2225
17. Hesp S, Hayashi N, Ueno T. J Appl Polym Sci (1991) 42: 877
18. Naitoh K, Ishii K, Tamaoka T, Omote T. J Photopolym Sci & Tech (1992) 5(2): 339
19. Schwalm R, Binder H, Funhoff D. J Appl Polym Sci (2000) 78: 208
20. Meyer U, Kern W, Hummel K, Stelzer F. Euro Polym J (1999) 35:69
21. Amou S, Nishimura S, Takahashi A, Hagiwara T, Hamana H, Narita T. J Polym Sci Polym Chem (1999) 37: 341
22. nd ed. ACS, Washington, D.C.
23. Hayase R, Onishi Y, Niki H, Oyasato N, Hayase S. J Electrochem. Soc. (1994) 141(11): 3141
24. Hattori T, Schlegl L, Imai A, Hayashi N, Ueno T. Opt. Eng. (1993) 32: 2368