A novel low temperature curable photosensitive polybenzoxazole

Polymer Journal

Volumn 37, Issue 7, 2005, Pages 517-521

  Toyokawa, Fumihiro ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Alkaline Developer; L' Line Lithography; Low Temperature Solid phase Cyclization; Photosensitive Polybenzoxazole; Poly(o hydroxyamine); Thermoacid Generator

Indexed keywords

ACETIC ACID; IMAGE ANALYSIS; IRRADIATION; LOW TEMPERATURE EFFECTS; PHOTOSENSITIVITY; POLYCONDENSATION;

ALKALINE DEVELOPER; L'LINE LITHOGRAPHY; LOW TEMPERATURE SOLID-PHASE CYCLIZATION; PHOTOSENSITIVE POLYBENZOXAZOLE; POLY(O-HYDROXYAMINE); THERMOACID GENERATOR;

POLYMERS;

EID: 24344474921     PISSN: 00323896     EISSN: None     Source Type: Journal    
DOI: 10.1295/polymj.37.517     Document Type: Article

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