Innovation via photosensitive polyimide and poly(benzoxazole) precursors - A review by inventor

Journal of Photopolymer Science and Technology

Volumn 17, Issue 5, 2004, Pages 685-691

  Rubner, Roland ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Innovation; Photoresist; Poly(benzoxazole); Polyimide; Precursor

Indexed keywords

BENZOXAZOLE DERIVATIVE; POLY(BENZOXAZOLE); POLYIMIDE; UNCLASSIFIED DRUG;

CHEMICAL INDUSTRY; COMMERCIAL PHENOMENA; CONFERENCE PAPER; DEVICE; ELECTRICITY; ELECTRONICS; ENCAPSULATION; FILM; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; PROCESS DEVELOPMENT; PROCESS MODEL; THERMOSTABILITY;

EID: 12444281680     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.685     Document Type: Conference Paper

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