Negative-type chemically amplified photosensitive semi-alicyclic polybenzoxazole via acid-catalyzed electrophilic substitution

Polymer Journal

Volumn 37, Issue 2, 2005, Pages 74-81

  Fukukawa, Ken Ichi ^a   Shibasaki, Yuji ^a   Ueda, Mitsuru ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chemically Amplified Photosensitive Polymer; Cross linker; Electrophilic Substitution; Low Dielectric Constant; Negative Image; Photoresist; Semi aromatic Polybenzoxazole

Indexed keywords

ACIDS; CATALYSIS; CROSSLINKING; HEAT TREATMENT; IMAGE ANALYSIS; MOLECULAR WEIGHT; PERMITTIVITY; PHOTORESISTS; REFRACTIVE INDEX; SUBSTITUTION REACTIONS;

CHEMICALLY AMPLIFIED PHOTOSENSITIVE POLYMERS; CROSS-LINKER; ELECTROPHILIC SUBSTITUTION; LOW DIELECTRIC CONSTANT; NEGATIVE IMAGE; SEMI-AROMATIC POLYBENZOXAZOLE;

AROMATIC POLYMERS;

EID: 15844394483     PISSN: 00323896     EISSN: None     Source Type: Journal    
DOI: 10.1295/polymj.37.74     Document Type: Article

References (22)

1. D. N. Khanna and W. H. Mueller, Polym. Eng. Sci., 29, 954 (1989).
2. H. Ahne, A. Hammerschmidt, and E. Schmidt, Proc. Polym. Mater. Sci. Eng., ACS, 60, 629 (1989).
3. R. Rubner, A. Hammerschmidt, R. Leuschner, and H. Ahne, in "Polym. Microelectron. Proc. Int. Symp," Y. Tabata, Ed., Kodansha, Tokyo, 1990, p 789.
4. R. Rubner, Adv. Mater., 2, 452 (1990).
5. T. Yamaoka, N. Nakajima, K. Koseki, and Y. Murayama, J. Polym. Sci., Part A: Polym. Chem., 28, 2517 (1990).
6. T. Banba, E. Takeuchi, A. Tokoh, and T. Takeda, "Proc. Electr. Compon. Conf., IEEE," 1991, p 564.
7. H. Ahne, R. Rubner, and R. Sezi, Appl. Surf. Sci., 106, 311 (1996).
8. R. Sezi, A. Maltenberger, W. Radlik, G. Shmid, A. Weber, and K. Buschick, Proc. SPIE, 3582, 236 (1998).
9. D. F. Huang, J. Y. Chiou, C. C. Hung, and B. R. Young, Proc. SPIE, 4277, 375 (2001).
10. K. Ebara, Y. Shibasaki, and M. Ueda, Polymer, 44, 333 (2003).
11. K. Fukukawa, Y. Shibasaki, and M. Ueda, Polym. J., 36, 489 (2004).
12. G. Maier, Prog. Polym. Sci., 26, 3 (2001).
13. K. Fukukawa, Y. Shibasaki, and M. Ueda, Macromolecules, 37, 8256 (2004).
14. K. Takeshi, K. Okuyama, Y. Ohba, and M. Ueda, J. Photopolym. Sci. Technol., 13, 345 (2000).
15. K. Tsuchiya, Y. Shibasaki, M. Suzuki, and M. Ueda, J. Polym. Sci., Part A: Polym. Chem., 42, 2235 (2004).
16. K. Fukukawa, K. Ebara, Y. Shibasaki, and M. Ueda, in "Advances in Imaging Materials and Processes" H. Ito, P. R. Varanasi, M. M. Khojasteh and R. Chen, Ed., Society of Plastic Engineers, Mid-Hudson Section, New York, N.Y., 2003, p 339.
17. T. Asakura, H. Yamato, and M. Ohwa, J. Photopolym. Sci. Technol., 13, 223 (2001).
18. K. Lenghaus, G. G. Qiao, and D. H. Solomon, Polymer, 42, 3355 (2001).
19. H. Seino, K. Iguchi, O. Haba, Y. Ohba, and M. Ueda, Polym. J., 31, 822 (1999).
20. S. M. Lee and M. J. Fréchet, Macromolecules, 27, 5160 (1994).
21. M. Ueda and T. Nakayama, Macromolecules, 29, 6427 (1996).
22. S. M. Lee, M. J. Fréchet, and C. G. Willson, Macromolecules, 27, 5154 (1994).