Electron-beam induced etching of resist with water vapor as the etching medium

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4262-4266

  Kohlmann von Platen, K T ^a   Bruenger, W H ^a  

^a Konstruktionstechnik   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013158987     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588587     Document Type: Article

References (27)

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