Atomic layer deposition of metal thin films

Proceedings - Electrochemical Society

Volumn PV 2005-09, Issue , 2005, Pages 545-554

  Leskelä, Markku ^a   Aaltonen, Titta ^a   Hämäläinen, Jani ^a   Niskanen, Antti ^a   Ritala, Mikko ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ORGANOMETALLICS; REDUCTION; TRANSITION METALS;

ATOMIC LAYER DEPOSITION (ALD); METAL THIN FILMS; THERMAL ACTIVATION;

THIN FILMS;

EID: 31744444606     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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