Nanoparticle manipulation in the near-substrate areas of low-temperature, high-density rf plasmas

Physics of Plasmas

Volumn 12, Issue 10, 2005, Pages 1-13

  Rutkevych, P P ^a   Ostrikov, K ^a,b   Xu, S ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; GLOW DISCHARGES; HEATING; HYDROCARBONS; PLASMAS;

HIGH-DENSITY PLASMAS; NANOPARTICLE DYNAMICS; PARTICLE DEPOSITION; TEMPERATURE GRADIENT;

NANOSTRUCTURED MATERIALS;

EID: 27644520490     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2102868     Document Type: Article

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