Numerical investigation of particle formation mechanisms in silane discharges

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 69, Issue 5 1, 2004, Pages

  De Bleecker, Kathleen ^a   Bogaerts, Annemie ^a   Gijbels, Renaat ^a   Goedheer, Wim ^b  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COMPUTER SIMULATION; DUST; GROUND STATE; HYDROGENATION; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; NEGATIVE IONS; NUCLEATION; PLASMA COLLISION PROCESSES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RATE CONSTANTS; SILICON; SOLAR CELLS; THIN FILMS;

ELECTRON ENERGY DISTRIBUTION FUNCTIONS (EEDF); ELECTRON KINETICS; GAS-PHASE REACTIONS; LANGEVIN RATE CONSTANTS;

SILANES;

EID: 37649031252     PISSN: 15393755     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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