Cluster-suppressed plasma CVD for deposition of high quality a-Si:H films

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 1-5

  Shiratani, Masaharu ^a   Koga, Kazunori ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Amorphous silicon; Cluster; Cluster suppressed plasma CVD method; High frequency discharge

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; PLASMAS; SILANES; SOLAR CELLS;

HIGH FREQUENCY DISCHARGE;

THIN FILMS;

EID: 0037416583     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01171-9     Document Type: Conference Paper

References (11)

1. Takai M., Nishimoto T., Takagi T., Kondo M., Matsuda A. J. Non-Cryst. Solids. 266:2000;90.
2. Koga K., Matsuoka Y., Tanaka K., Shiratani M., Watanabe Y. Appl. Phys. Lett. 77:2000;196.
3. Shiratani M., Watanabe Y. Rev. Laser Eng. 26:1998;449.
4. Watanabe Y., Shiratani M., Fukuzawa T., Koga K. J. Tech. Phys. 41:2000;505.
5. Shiratani M., Fukuzawa T., Watanabe Y. Jpn. J. Appl. Phys. 38:1999;4525.
6. Shiratani M., Maeda S., Koga K., Watanabe Y. Jpn. J. Appl. Phys. 39:2000;287.
7. Shiratani M., Fukuzawa T., Eto K., Watanabe Y. Jpn. J. Appl. Phys. 31:1992;L1791.
8. Koga K., Kai M., Shiratani M., Watanabe Y., Shikatani N. Jpn. J. Appl. Phys. 41:2002;L168.
9. T. Nishimoto, M. Takai, M. Kondo, A. Matsuda, Proceedings of 28th IEEE Photovoltaic Specialists Conference, vol. 28, IEEE, Alaska, 2000, pp. 876-880.
10. Striganov A.R., Sventitskii N.S. Tables of Spectral Lines of Neutral and Ionized Atoms. 1968;77-581 IFI/PLENUM, New York.
11. Perrin J., Aarts J.F.M. Chem. Phys. 80:1983;351.