The effect of RF power on the deposition behavior of anatase clusters

Thin Solid Films

Volumn 436, Issue 2, 2003, Pages 181-185

  Barnes, Mark C ^a   Gerson, Andrea R ^a   Kumar, Sunil ^a   Hwang, Nong Moon ^b  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

^b Seoul National University   (South Korea)

Author keywords

Chemical vapor deposition (CVD); Clusters; Nanostructures; Oxides; Titanium oxide

Indexed keywords

AGGLOMERATION; CRYSTALLINE MATERIALS; ELECTRODEPOSITION; FILM GROWTH; NANOSTRUCTURED MATERIALS; NUCLEATION; SELF ASSEMBLY;

ANATASE CLUSTERS;

THIN FILMS;

EID: 0037525714     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00599-6     Document Type: Article

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