Electron heating mode transition observed in a very high frequency capacitive discharge

Applied Physics Letters

Volumn 83, Issue 8, 2003, Pages 1533-1535

  Abdel Fattah, E ^a   Sugai, H ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; HEATING; PLASMAS;

CAPACITIVE DISCHARGE;

ELECTRON ENERGY LEVELS;

EID: 0042281658     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1604941     Document Type: Article

References (16)

1. A. A. Howling, J. L. Dorier, Ch. Hollenstein, U. Kroll, and F. Finger, J. Vac. Sci. Technol. A 10, 1080 (1992).
2. A. Koshiishi, M. Tomoyasu, Y. Tahara, and M. Kojima, Proc. 19th Symposium on Dry Process, Tokyo, 1998, p. 229.
3. M. Surenda and D. B. Graves, Appl. Phys. Lett. 59, 2091 (1991).
4. M. J. Colgan, M. Meyyappan, and D. E. Murnick, Plasma Sources Sci. Technol. 3, 181 (1993).
5. V. A. Godyak and R. B. Piejak, Phys. Rev. Lett. 65, 996 (1990).
6. I. D. Kaganovich and L. D. Tsendin, IEEE Trans. Plasma Sci. 20, 66 (1992).
7. H. Sugai, I. Ghanashev, and K. Mizuno, Appl. Phys. Lett. 77, 3523 (2000).
8. H. Sugai, I. Ghanashev, M. Hosokawa, K. Mizuno, K. Nakamura, H. Toyoda, and K. Yamaguchi, Plasma Sources Sci. Technol. 10, 378 (2001).
9. C. M. Horwitz, J. Vac. Sci. Technol. A 1, 1795 (1983).
10. I. D. Sudit and F. F. Chen, Plasma Sources Sci. Technol. 3, 162 (1994).
11. E. Stamate and K. Ohe, J. Appl. Phys. 84, 2450 (1998).
12. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, Plasma Sources Sci. Technol. 1, 347 (1992).
13. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
14. M. M. Turner, Phys. Rev. Lett. 75, 1312 (1995).
15. G. Gozadinos, M. M. Turner, and D. Vender, Phys. Rev. Lett. 87, 135004 (2001).
16. M. Hayashi, Technical Report No. IPPJ-AM-19, 1981.