Simulation of gas-phase nanoparticle dynamics in the plasma-enhanced chemical vapor deposition of carbon nanostructures

Physica Scripta

Volumn 70, Issue 5, 2004, Pages 322-325

  Rutkevych, P P ^a   Ostrikov, K ^a,b   Denysenko, I B ^c   Storer, R G ^d   Xu, S ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF SYDNEY   (Australia)

^c V N KARAZIN KHARKIV NATIONAL UNIVERSITY   (Ukraine)

^d FLINDERS UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION; CARBON; CHEMICAL VAPOR DEPOSITION; COMPLEXATION; COMPUTER SIMULATION; INDUCTIVELY COUPLED PLASMA; MIXTURES; NANOSTRUCTURED MATERIALS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY;

CARBON NANOSTRUCTURES; NANOPARTICLE DYNAMICS; TEMPERATURE FLUCTUATIONS;

GAS DYNAMICS;

EID: 8644261489     PISSN: 00318949     EISSN: None     Source Type: Journal    
DOI: 10.1088/0031-8949/70/5/010     Document Type: Article

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