Atomic structure of the nanocrystalline Si particles appearing in nanostructured Si thin films produced in low-temperature radiofrequency plasmas

Journal of Applied Physics

Volumn 92, Issue 8, 2002, Pages 4684-4694

  Viera, G ^a   Mikikian, M ^a   Bertran, E ^b   Cabarrocas, P Roca I ^c   Boufendi, L ^a  

^a UNIVERSITÉ D'ORLÉANS   (France)

^b UNIVERSITY OF BARCELONA   (Spain)

^c LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE STRUCTURE; DIAMONDLIKE STRUCTURES; ELECTRON TRANSMISSION MICROSCOPY; LOW TEMPERATURES; NANO-STRUCTURED; NANOCRYSTALLINE PARTICLE; NANOCRYSTALLINE SI; PLASMA CONDITIONS; RADIO FREQUENCY PLASMA; ROOM TEMPERATURE; SILANE PLASMAS; SILICON MATERIALS; SIMULTANEOUS DEPOSITION; TWO PHASE MIXTURES;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRON DIFFRACTION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA THEORY; SILICON; TEMPERATURE; THIN FILMS;

AMORPHOUS SILICON;

EID: 18744416519     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1506382     Document Type: Article

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