Self-assembly of uniform carbon nanotip structures in chemically active inductively coupled plasmas

Diamond and Related Materials

Volumn 13, Issue 10, 2004, Pages 1923-1929

  Tsakadze, Z L ^a   Ostrikov, K ^a,b   Long, J D ^a   Xu, S ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF SYDNEY   (Australia)

Author keywords

Electronic device structures; Etching; Nanoparticles; Nanostructures; Plasma CVD; Surface microscopy; Surface structure

Indexed keywords

CARBON NANOTIP (CNTP) STRUCTURES; ELECTRONIC DEVICE STRUCTURES; NANOPARTICLES; SURFACE MICROSCOPY;

CATALYSTS; CRYSTALLINE MATERIALS; ETCHING; INDUCTIVELY COUPLED PLASMA; NANOSTRUCTURED MATERIALS; NICKEL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE STRUCTURE;

CARBON NANOTUBES;

EID: 7644229911     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.06.010     Document Type: Article

References (25)

1. S. Iijima, Nature 354 (1991) 56.
2. M.S. Dresselhaus, G. Dresselhaus, P.C. Eklund, Science of Fullerenes and Carbon Nanotubes, Academic Press, San Diego, 1996.
3. C. Journet, W.K. Maser, P. Bernier, A. Loiseau, M. Lamy de la Chapelle, S. Lefrant, P. Deniard, R. Lee, J.E. Fisher, Nature 388 (1997) 756.
4. K. Tanaka, T. Yamabe, K. Fukui (Eds.), The Science and Technology of Carbon Nanotubes, Elsevier, Amsterdam, 1999.
5. E.T. Thostenson, Z. Ren, T.W. Chou, Compos. Sci. Technol. 61 (2001) 1899.
6. L. Nilsson, O. Groening, O. Kuettel, P. Groening, L. Schlapbach, J. Vac. Sci. Technol. 20 (2002) 326.
7. S. Fan, M. Chapline, N.R. Franklin, T.W. Tombler, A.M. Cassell, H. Dai, Science 283 (1999) 512.
8. C.L. Tsai, C.W. Chao, C.L. Lee, H.C. Shih, Appl. Phys. Lett. 74 (1999) 3462.
9. C. Bower, W. Zhu, S. Jin, O. Zhou, Appl. Phys. Lett. 77 (2000) 830.
10. M. Chhowalla, K.B.K. Teo, C. Ducati, N.L. Rupersinghe, G.A.J. Amaratunga, A.C. Ferrari, D. Roy, J. Robertson, W.I. Milne, J. Appl. Phys. 90 (2001) 5308.
11. C.L. Tsai, C.F. Chen, L.K. Wu, Appl. Phys. Lett. 81 (2002) 721.
12. L. Delzeit, I. McAnich, B.A. Cruden, D. Hash, B. Chen, J. Han, M. Meyyappan, J. Appl. Phys. 91 (2002) 9.
13. K.B.K. Teo, M. Chhowalla, G.A.J. Amaratunga, W.I. Milne, D.G. Hasko, G. Pirio, P. Legagneux, F. Wyczisk, D. Pribat, Appl. Phys. Lett. 79 (2001) 1534.
14. S. Xu, K.N. Ostrikov, Y.A. Li, E.L. Tsakadze, I.R. Jones, Phys. Plasmas 8 (2001) 2459.
15. Y. Shiratori, H. Hiraoka, Y. Takeuchi, M. Yamamoto, Appl. Phys. Lett. 82 (2003) 2485.
16. D. Reznik, C.H. Olk, D.A. Neumann, J.R.D. Copley, Phys. Rev., B 52 (1995) 116.
17. A. Ilie, A.C. Ferrari, T. Yagi, S.E. Rodil, J. Robertson, E. Barborini, P. Milani, J. Appl. Phys. 90 (2001) 2024.
18. J.W. Ager III, D.K. Veirs, G.M. Rosenblatt, Phys. Rev., B 43 (8) (1991) 6491.
19. V. Ligatchev, Physica. B 337 (2003) 333.
20. Y.J. Li, Z. Sun, S.P. Lau, G.Y. Chen, B.K. Tay, Appl. Phys. Lett. 79 (11) (2001) 1670.
21. K.B.K. Teo, M. Chhowalla, G.A.J. Amaratunga, W.I. Milne, G. Pirio, P. Legagneux, F. Wyczisk, D. Pribat, D.G. Hasko, Appl. Phys. Lett. 80 (11) (2002) 2011.
22. E. Kovacevic, I. Stefanovic, J. Berndt, J. Winter, J. Appl. Phys. 93 (2003) 2924.
23. S.V. Vladimirov, K. Ostrikov, Phys. Rep. 393 (2004) 175.
24. G. Viera, M. Mikikian, E. Bertran, P.R. Cabarrocas, L. Boufendi, J. Appl. Phys. 92 (2002) 4684.
25. J. Perrin, M. Shiratani, P. Kae-Nune, H. Videlot, J. Jolly, J. Guillion, J. Vac. Sci. Technol. 16 (1998) 278.