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Volumn 67, Issue 5 2, 2003, Pages

Low-pressure diffusion equilibrium of electronegative complex plasmas

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; DIFFUSION IN LIQUIDS; ELECTRIC FIELDS; ELECTRONS; FLUOROCARBONS; HYDROCARBONS; MATHEMATICAL MODELS; PLASMA THEORY; SILANES;

EID: 42749100706     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (63)

References (46)
  • 1
    • 0004165928 scopus 로고    scopus 로고
    • edited by C.Y. Chang and S.M. Sze (McGraw-Hill, New York)
    • ULSI Technology, edited by C.Y. Chang and S.M. Sze (McGraw-Hill, New York, 1996).
    • (1996) ULSI Technology
  • 2
    • 0004255148 scopus 로고
    • edited by D.M. Manos and D.L. Flamm (Academic, New York)
    • Plasma Etching: An Introduction, edited by D.M. Manos and D.L. Flamm (Academic, New York, 1989).
    • (1989) Plasma Etching: An Introduction
  • 19
    • 0038081258 scopus 로고    scopus 로고
    • [Phys. Usp. 40, 53 (1997)]
    • V.N. Tsytovich, Usp. Fiz. Nauk 40, 53 (1997) [Phys. Usp. 40, 53 (1997)], and references therein.
    • (1997) Usp. Fiz. Nauk , vol.40 , pp. 53
    • Tsytovich, V.N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.