Si-H bonding in low hydrogen content amorphous silicon films as probed by infrared spectroscopy and x-ray diffraction

Journal of Applied Physics

Volumn 87, Issue 4, 2000, Pages 1650-1658

  Mahan, A H ^a   Gedvilas, L M ^a   Webb, J D ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001108725     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372073     Document Type: Article

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