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Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 305-309

Intrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications

(5) Klein, Stefan a,b Finger, Friedhelm a Carius, Reinhard a Wagner, Heribert a Stutzmann, Martin b

a FORSCHUNGSZENTRUM JÜLICH (Germany)

b WALTER SCHOTTKY INSTITUT (Germany)

Author keywords

Hot wire CVD; Silicon; Solar cells; Structural properties

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; FILM GROWTH; POROSITY; SILICON SOLAR CELLS; SUBSTRATES; THIN FILMS;

HOT WIRE DEPOSITION; MICROCRYSTALLINE SILICON;

AMORPHOUS SILICON;

EID: 0035801178 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01280-9 Document Type: Conference Paper

Times cited : (47)

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