Formation of silicon-based thin films prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 6 A, 1998, Pages 3175-3187

  Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Amorphous silicon; Cat CVD; Catalytic CVD; Cracking reaction; Hot wire CVD; Poly silicon; Silicon nitride; Thin film deposition

Indexed keywords

EID: 0000775425     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.3175     Document Type: Article

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