Influence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 61-65

  Ledermann, Andrea ^a   Weber, Urban ^a   Mukherjee, Chandrachur ^a   Schroeder, Bernd ^a  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

Amorphous materials; Chemical vapor deposition (CVD); Deposition process; Scaleup; Solar cells; Uniformity

Indexed keywords

AMORPHOUS FILMS; INTERFACES (MATERIALS); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RATE CONSTANTS; SILANES; SILICON SOLAR CELLS; SUBSTRATES;

FILAMENT GEOMETRY;

THIN FILMS;

EID: 0035801001     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01208-1     Document Type: Conference Paper

References (11)