Intrinsic microcrystalline silicon prepared by hot-wire chemical vapour deposition for thin film solar cells

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 202-207

  Klein, Stefan ^a,b   Finger, Friedhelm ^a   Carius, Reinhard ^a   Dylla, Thorsten ^a   Rech, Bernd ^a   Grimm, Michael ^a   Houben, Lothar ^a   Stutzmann, Martin ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b WALTER SCHOTTKY INSTITUT   (Germany)

Author keywords

Hot wire chemical vapour deposition; Microcrystalline silicon; Solar cells

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC POTENTIAL; ELECTRON DIFFRACTION; FILM PREPARATION; IMAGE ANALYSIS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SOLAR CELLS; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

SEMICONDUCTING SILICON;

EID: 0037850818     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00111-1     Document Type: Conference Paper

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