Amorphous and microcrystalline silicon by hot wire chemical vapor deposition

Journal of Applied Physics

Volumn 79, Issue 5, 1996, Pages 2699-2706

  Heintze, M ^a   Zedlitz, R ^a   Wanka, H N ^a   Schubert, M B ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000593191     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361100     Document Type: Article

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