Microcrystalline silicon films and solar cells deposited by PECVD and HWCVD

Solar Energy

Volumn 77, Issue 6, 2004, Pages 893-908

  Klein, S ^a   Repmann, T ^a   Brammer, T ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Hot wire chemical vapour deposition; Microcrystalline silicon; Plasma enhanced chemical vapour deposition; Thin film solar cells

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; GLOW DISCHARGES; HIGH PRESSURE EFFECTS; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; SUBSTRATES; THIN FILMS;

AMORPHOUS GROWTH; HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); MICROCRYSTALLINE SILICON; OPEN CIRCUIT VOLTAGE;

SILICON SOLAR CELLS;

SOLAR POWER;

EID: 9944241842     PISSN: 0038092X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solener.2004.08.029     Document Type: Article

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