EUV Lithography development in Europe: Present status and perspectives

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5196, Issue , 2004, Pages 57-70

  Ceccotti, Tiberio ^a  

^a CEA SACLAY   (France)

Author keywords

Discharge produced plasmas; EUVL; Laser produced plasmas; Lithography; NGL

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC DISCHARGES; LASER PRODUCED PLASMAS; PHASE SHIFT; PRODUCTIVITY;

DISCHARGED PRODUCED PLASMAS; EUVL; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); NEXT GENERATION LITHOGRAPHY (NGL); NGL;

PHOTOLITHOGRAPHY;

EID: 1942453789     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.510247     Document Type: Conference Paper

References (57)

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26. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
27. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
28. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
29. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
30. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
31. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
32. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
33. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
34. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
35. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
36. M. A. Klosner and W. T. Silfvast, "High-temperature lithium metal-vapor capillary discharge extreme-ultraviolet source at 13.5 nm", Appl. Optics 39 (21), p. 3678, 2000. W. T. Silfvast and M. A. Klosner, "Xenon-emission-spectra identification in the 5-20-nm spectral region in highly ionized xenon capillary-discharge plasmas", J. Opt. Soc. Am. B: Optical Physics 17 (7), p. 1279, 2000. W. T. Silfvast and M. A. Klosner, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region", Opt. Lett. 23, p. 1609, 1998. W. T. Silfvast et al., "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV Lithography", Proc. SPIE 3676, p. 272, 1999. M. McGeoch, "Radio-Frequency-Preionized Xenon Z-Pinch Source for Extreme Ultraviolet Lithography", Appl. Opt. 37, p. 1651, 1998. M. McGeoch, "High-power extreme ultraviolet source based on a Z-pinch", Proc. SPIE Vol. 3676, p. 697, 1999. W. N. Partlo et al, "Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor", Proc. SPIE Vol. 3997, p. 136, 2000. K. Bergmann et al, "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma", Appl. Opt. 38, p. 5413, 1999. G. Schriever et al, "Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts", Proc. SPIE Vol. 3997, p. 162, 2000. K. Bergmann et al, "Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency", Appl. Opt. 39, p. 3833, 2000. N. R. Fornaciari et al, "Development of an electric capillary discharge source ", Proc. SPIE Vol. 3997, p. 120, 2000. G. D. Kubiak et al, "Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography", Proc. SPIE Vol. 3676, p. 669, 1999. G. D. Kubiak et al, "High-power source and illumination system for extreme ultraviolet lithography", Proc. SPIE Vol. 3767, p. 136, 1999. J. E. Goldsmith et al, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE Vol. 3676, p. 264, 1999. D. A. Tichenor et al, "EUV engineering test stand", Proc. SPIE Vol. 3997, p. 48, 2000.
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