Pinch plasma radiation sources for the extreme ultraviolet

Contributions to Plasma Physics

Volumn 41, Issue 6, 2001, Pages 589-597

  Neff, W ^a   Bergmann, K ^a   Rosier, O ^b   Lebert, R ^c   Juschkin, L ^c  

^a FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

^c AIXUV GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; LASER PRODUCED PLASMAS; LIGHT SOURCES; SEMICONDUCTOR LASERS;

EUV SOURCE; EXTREME ULTRA-VIOLET LITHOGRAPHIES; EXTREME ULTRAVIOLET; OPTICAL COMPONENTS; OPTICAL RADIATIONS; PINCH PLASMA; PLASMA RADIATION SOURCES; PLASMA TECHNOLOGY; RADIATION SOURCE; SHORT PERIODS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 0035729663     PISSN: 08631042     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3986(200111)41:6<589::AID-CTPP589>3.0.CO;2-Z     Document Type: Article

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