Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 136-156

  Partlo, William ^a   Fomenkov, Igor ^a   Oliver, Roger ^a   Birx, Daniel ^a  

^a CYMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT SOURCES; LITHIUM; PLASMA DENSITY; PLASMA STABILITY; ULTRAVIOLET RADIATION; VAPORS;

DENSE PLASMA FOCUS (DPF) TECHNOLOGY; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); FULL WIDTH AT HALF MAXIMUM (FWHM);

PHOTOLITHOGRAPHY;

EID: 0033684545     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)