High power EUV sources based on gas discharge plasmas and laser produced plasmas

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 83-88

  Schriever, G ^a   Stamm, U ^a   Gabel K ^b   Darscht, M ^b   Borisov, V ^c   Khristoforov, O ^c   Vinokhodov, A ^c  

^a XTREME Technologies GmbH   (Germany)

^b XTREME Technologies   (Germany)

^c TROITSK INSTITUTE FOR INNOVATION AND FUSION RESEARCH   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; HIGH POWER LASERS; LASER PRODUCED PLASMAS; ULTRAVIOLET RADIATION; XENON;

GAS DISCHARGE PLASMAS;

MICROELECTRONICS;

EID: 0036643689     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00514-2     Document Type: Conference Paper

References (2)

1. EUV source development at Lambda Physik and Jenoptik LOS
2. EUV sources for lithography