Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 669-678

  Kubiak, Glenn D ^a   Bernardez, Luis J ^a   Krenz, Kevin ^a   Sweatt, William C ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA JETS; PLASMA SOURCES; PULSED LASER APPLICATIONS; ULTRAVIOLET RADIATION; XENON;

CLUSTER JET LASER PLASMA SOURCE; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0032654747     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351142     Document Type: Conference Paper

References (5)