Extreme ultraviolet light generation based on laser produced plasmas (LPP) and gas discharge based pinch plasmas: A comparison of different concepts

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 162-168

  Schriever, Guido ^a   Rahe, Manfred ^a   Neff, Willi ^a   Bergmann, Klaus ^a   Lebert, Rainer ^a   Lauth, Hans ^a   Basting, Dirk ^a  

^a Lambda Physik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LASER PRODUCED PLASMAS; PINCH EFFECT;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0033699050     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)